Photoelectric Effect of Nickel

The photoelectric effect was investigated by L. P. Davies, J. F. Chittum, J. S. Hunter, R. Hamer, R. B. Jones, H. Klumb, J. R. Nillson, T. Pavolini, G. Reboul, S. C. Roy, F. Hlucka, W. Klug, J. Chadwick and M. Goldhaber, A. G. Shenstone, J. J. Weigle, and G. B. Welch. S. Werner gave 2850 A. for the photoelectric threshold corresponding with the limiting frequency of the photoelectric effect; R. Hamer gave 3050 A.; G. B. Welch, 3050 A.; and J. J. Weigle, 3540 A. The subject was studied by J. H. Wolfenden, C. Kenty, P. Lukirsky and S. Prilezaeff, U. Nakaya, F. Hlucka, G. B. Bandopadhyaya, G. N. Glasoe, O. Koppius, and F. G. Tucker. H. Klumb, O. I. Leypunsky, and W. Frese investigated the influence of occluded gas on the photoelectric effect; and R. F. Hanstock, the effect of polishing the metal. H. S. Allen, and W. Frese found that the oxidizing agents which make nickel passive are those which reduce the photoelectric sensitiveness. F. Ehrenhaft found that powdered nickel exhibited positive and negative photophoresis, or movement with or against the direction of a beam of incident light.